Copper silicide Cu5Si

Purity: 99%
Melting point: 825℃
Density: 7.8g/cm3
Color: gray-black

Copper silicide (Cu5si), also known as pentacopper silicide, is a binary silicon compound of copper and an intermetallic compound, which means that its properties are between ionic compounds and alloys. It has excellent electrical conductivity, thermal conductivity, ductility, corrosion resistance and wear resistance. Copper silicide film is used for passivate copper-based chips, inhibit their diffusion and electron migration, and serve as diffusion barrier. Copper silicide can also be used to directly synthesize organosilicon compounds in industry. In the reaction, copper silicide can silicify chloromethane. For example, dimethyldichlorosilane, which is industrially useful, can be prepared.
It can also be used in silicate electronics industry-electric vacuum devices-integrated circuits-ships-automobiles-light industry-aerospace and other scientific and technological fields!